Development of a High Sensitivity Plasma Absorption Probe and RF Sheath Effect Analysis
碩士 === 國立清華大學 === 工程與系統科學系 === 103 === Nowadays, in the semiconductor manufacturing process, the stability of plasma processing influence greatly to yield rate, while the plasma density is the key parameters for plasma processing. Therefore, monitoring and maintaining the plasma, by adjusting proced...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/12141045609476004026 |