Modulated-oxidation ALD of m-ZnO epitaxial thin films
碩士 === 國立中山大學 === 物理學系研究所 === 103 === This research studies the zinc oxide thin films by using atomic layer deposition (ALD) under periodically modulated exposures to an extra sequence of water. Water was used as an oxidizing precursor in the layer by layer deposition of zinc and oxygen atoms. The s...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/48796754250324636989 |