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碩士 === 國立中央大學 === 機械工程學系 === 103 === In this study, OES (Optical emission spectrometer), and QMS (Quadrupole mass spectrometry) were utilized as plasma diagnostics tools and a-Si:H (Hydrogenated amorphous silicon ) thin film was deposited by electron cyclotron resonance chemical vapor deposition (EC...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/18595524124748266715 |