Investigation and Analysis of Random Variations on TFET and FinFET Devices and Logic Circuits
碩士 === 國立交通大學 === 電子工程學系 電子研究所 === 103 === This thesis investigates and analyses the variability of metal-gate work function variation (WFV) and fin line-edge-roughness (fin LER) on the homojunction TFET and FinFET devices and logic circuits operating in near-threshold region by using 3D atomistic T...
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| Format: | Others |
| Language: | en_US |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/29463653907832238555 |