Quantum interference effect in cobalt disilicide thin films
碩士 === 國立交通大學 === 物理研究所 === 103 === Cobalt disilicide (CoSi_2) is a kind of common silicides in semiconductor industry. The crystal structure of CoSi_2 is very similar to silicon, so it's ready to grow good epitaxial layers on silicon substrates and the resulting CoSi_2 possesses low resistivit...
Main Authors: | Wang, Chang-Jan, 王昶然 |
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Other Authors: | Lin, Juhn-Jong |
Format: | Others |
Language: | zh-TW |
Published: |
2015
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Online Access: | http://ndltd.ncl.edu.tw/handle/28104337178684446010 |
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