Quantum interference effect in cobalt disilicide thin films

碩士 === 國立交通大學 === 物理研究所 === 103 === Cobalt disilicide (CoSi_2) is a kind of common silicides in semiconductor industry. The crystal structure of CoSi_2 is very similar to silicon, so it's ready to grow good epitaxial layers on silicon substrates and the resulting CoSi_2 possesses low resistivit...

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Bibliographic Details
Main Authors: Wang, Chang-Jan, 王昶然
Other Authors: Lin, Juhn-Jong
Format: Others
Language:zh-TW
Published: 2015
Online Access:http://ndltd.ncl.edu.tw/handle/28104337178684446010