The study of the effect of silicon nitride layer on inhibiting meltback etching phenomenon for growth of GaN on Si(111)

碩士 === 國立交通大學 === 材料科學與工程學系所 === 103 === GaN on Si(111) is an important structure in high-power devices for which heteroepitaxy of GaN on Si plays a critical role in the device fabrication. However, direct growth of GaN on Si may accompany with meltback etching reaction on Si which deteriorate the f...

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Bibliographic Details
Main Authors: Chang, Shou-Liang, 張守諒
Other Authors: Chang, Li
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/68594158416568938000