Effects of different radio-frequency powers on inductively coupled plasma thermal chemical vapor deposition carbon thin films using ethene/nitrogen mixtures
碩士 === 國立中興大學 === 材料科學與工程學系所 === 103 === This study investigates the effects of different radio-frequency (rf) powers on the properties of carbon thin films prepared by thermal chemical vapor deposition (thermal CVD) enhanced with inductively coupled plasma. The residual gases in the thermal CVD pro...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/32819060933429947588 |