| Summary: | 碩士 === 龍華科技大學 === 機械工程系碩士班 === 103 === Hard films own lower friction coefficient, high hardness, higher wear, corrosion resistance and excellent thermal stability, have been widely used to improve tools and machine parts. ZrWN thin films were deposited onto tungsten carbide tools and glass substrates, by direct current reactive magnetron co-sputter. The targets were Zr and W, Ar was the plasma gas and N2 was the reactive gas. An orthogonal array, the signal-to-noise ratio and analysis of variance are used to analyze the effect of the ZrWN film deposition parameters. Using the Taguchi method for design of a robust experiment, the main deposition parameters, such as DC power of sputtering (100, 200, 300 Watt), working pressure (6.5, 8, 15 mtorr), substrate plasma etching power (un-etching, 100, 200 Watt) and annealing temperature (as-deposited, 200, 400°C) were optimized. The surface morphologies and structural properties the film was determined by SEM. Dry milling of low carbon steel (S20C, 50×70 mm) tests was carried out with these coated and un-coated tools. It is found the shows the use of ZrWN films coated on the cutting tool remarkably decreases roughness and flank wear. In the confirmation runs, when using grey relational analysis, improvement of 35.5% was obtained in surface roughness and 41.6% in flank wear, respectively. In the study the performance characteristics of the ZrWN films are better than that the commercially available coating cutter.
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