The Utilization of Taguchi Method for Optimizing the Parameter of Ion Implantation Process

碩士 === 國立高雄應用科技大學 === 工業工程與管理系碩士在職專班 === 103 === The demand for mobile device increases and keeps growing with technology advancement. So the mobile device tends to equip with extraordinary efficacy. To meet nowadays mobile device specification, the use for ion implanter dramatically raises because...

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Bibliographic Details
Main Authors: Hsu Tsung Pao, 徐琮堡
Other Authors: Shu Ming Hung
Format: Others
Language:zh-TW
Published: 2015
Online Access:http://ndltd.ncl.edu.tw/handle/32476827908979426009