Minimizing the tardiness on a single machine with dust accumulation consideration
碩士 === 中原大學 === 工業與系統工程研究所 === 103 === This paper considers wafer manufacturing of semiconductor where wafer cleaning should be taken to avoid pollution. The function of wafer cleaning is to clean up the dirt, i.e., particle, organic, and metal-lons on the surface of wafer. The main materials of waf...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2015
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| Online Access: | http://ndltd.ncl.edu.tw/handle/05210551895642809736 |