| Summary: | 碩士 === 元智大學 === 電機工程學系 === 102 === This thesis discussed the high-temperature process of the Low Temperature Poly-Silicon (LTPS). Due to the thermal expansion and contraction characteristics of this process, there would be physical total pitch contraction errors which would affect the product quality and induce light leakage problems. Therefore, this paper studies the method of run-to-run control which uses a simple linear function to represent the LTPS exposure process. Various run-to-run control methods were studied including Moving Average (MA), Exponentially Weighted Moving Average (EWMA), modified-EWMA, and Double-EWMA. These run-to-run control methods were simulated, and the results show the run-to-run control can effectively improve the quality of LTPS exposure process.
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