FMEA Integrate Quality Control System To Study How To Improve Rework Rates Of Photo Resist.
碩士 === 元智大學 === 工業工程與管理學系 === 102 === For the manufacturing process of wafer level package, photo resist is one of the main materials that might cause environment pollution. Usually we lead photo resist to start the chemical reaction and get the wafer layout we need. But also some poisonous waste...
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/53167938416679400814 |