Optoelectronic properties of copper chromium oxide films prepared by sputtering deposition and atmospheric pressure microwave plasma
碩士 === 亞洲大學 === 光電與通訊學系 === 102 === In this study, preparation of CuCrO2 films was using magnetron sputtering and atmospheric pressure microwave plasma treatment. The crystal structure, microstructure and optoelectronic properties were investigated. For plasma treatment imposed, the amorphous as-dep...
Main Authors: | , |
---|---|
Other Authors: | |
Format: | Others |
Language: | zh-TW |
Published: |
2014
|
Online Access: | http://ndltd.ncl.edu.tw/handle/04492287633523290251 |