Optoelectronic properties of copper chromium oxide films prepared by sputtering deposition and atmospheric pressure microwave plasma

碩士 === 亞洲大學 === 光電與通訊學系 === 102 === In this study, preparation of CuCrO2 films was using magnetron sputtering and atmospheric pressure microwave plasma treatment. The crystal structure, microstructure and optoelectronic properties were investigated. For plasma treatment imposed, the amorphous as-dep...

Full description

Bibliographic Details
Main Authors: Ming-Che Wang, 王明哲
Other Authors: Ruei-Sung Yu
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/04492287633523290251