Study of aluminum-doped zinc oxide thin films by atomic layer deposition

碩士 === 聖約翰科技大學 === 自動化及機電整合研究所 === 102 === This work characterizes the mechanical and opto-electrical properties of aluminum doped Zinc Oxide (AZO) thin films on flexible PET substrates deposited by atomic layer deposition (ALD). The Aluminum composition of the AZO films was 2% by controlling the ra...

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Bibliographic Details
Main Authors: Jie-Wen Shih, 石介文
Other Authors: Rwei-Ching Chang
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/70709030423693686863
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Summary:碩士 === 聖約翰科技大學 === 自動化及機電整合研究所 === 102 === This work characterizes the mechanical and opto-electrical properties of aluminum doped Zinc Oxide (AZO) thin films on flexible PET substrates deposited by atomic layer deposition (ALD). The Aluminum composition of the AZO films was 2% by controlling the ratio of Zn:Al pulses as 49:1. The deposition process is heated by radiation method to protect the polymer substrates. Three types of plasma surface treatment, three deposition temperatures, and four film thicknesses are considered in prepared the specimens. Photoluminescence spectrometer, micro scratcher, Hall effects meter, X-ray diffraction machine, and nanoindentor are used to characterize the properties of the AZO thin films. The results show that the adhesion are improve by the surface plasma treatment of the PET substrates. The electric properties increase as the deposition temperature elevates. For various thicknesses, 100 nm thickness has the best electric property and the adhesion increases as the film thickness increases.