Development of wafer warpage measurement technique using Moire method

碩士 === 國立臺灣科技大學 === 機械工程系 === 102 === A non-contact warpage measurement technique by using the Moire effect method is proposed in this study. The technique is simple and easy to set up. It consists of a light source, a linear grating, a Charge-coupled Device (CCD) camera, a beam-splitter, and a focu...

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Bibliographic Details
Main Authors: Yu-hsuan Tsai, 蔡宇軒
Other Authors: Hung-lin Hsieh
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/66870959175439593807