Establishment of a theoretical model for calculating the thickness of chemical reaction layer of sapphire substrate to slurry and the related experimental analysis

碩士 === 國立臺灣科技大學 === 機械工程系 === 102 === The paper innovatively proposes a theoretical model for estimating the thickness of chemical reaction layer of sapphire wafer substrate, which is affected by and under chemical reaction to slurry. Atomic force microscopy (AFM) experiment is made to estimate the...

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Bibliographic Details
Main Authors: Hao-yang Ding, 丁晧洋
Other Authors: Zone-Ching Lin
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/91116707597936202490