Stress Analysis and Applications of Titanium Oxide Thin Films Grown by Atomic Layer Deposition
碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 102 === In this study, we investigate the properties of TiO2 thin films grown by atomic layer deposition method (ALD) and apply them to the resistive random access memory devices (ReRAM). For the application in the ReRAM devices, various characterization methods, su...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/26468249765209831417 |