The Study of Boron Pre-dep Process Improved by Low-pressure Chemical Vapor Deposition Technology

碩士 === 國立臺灣海洋大學 === 電機工程學系 === 102 === Current low concentration (440 ohm/sq) boron pre-deposition processes can not achieve good uniformity performance, results in poor reproducibility and cause to additional processes &; production cycle time. This paper investigates a strategy to reduce non-u...

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Bibliographic Details
Main Authors: HUANG, JEN-CHIEH, 黃仁杰
Other Authors: Ho, Jyh-Jier
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/28839318708398702378