Development of Novel Implant Masking Processes for Double Self-Aligned 4H-SiC DMOSFETs

碩士 === 國立清華大學 === 電子工程研究所 === 102 === 因申請專利緣故，資料延後公開

Bibliographic Details
Main Author:	江政毅
Other Authors:	黃智方
Format:	Others
Language:	zh-TW
Published:	2014
Online Access:	http://ndltd.ncl.edu.tw/handle/61123879564193766458

id	ndltd-TW-102NTHU5428058
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spelling	ndltd-TW-102NTHU54280582016-03-09T04:34:23Z http://ndltd.ncl.edu.tw/handle/61123879564193766458 Development of Novel Implant Masking Processes for Double Self-Aligned 4H-SiC DMOSFETs 雙對準4H碳化矽垂直型金氧半場效電晶體之新穎離子佈植遮罩製程研發江政毅碩士國立清華大學電子工程研究所 102 因申請專利緣故，資料延後公開黃智方 2014 學位論文 ; thesis 56 zh-TW
collection	NDLTD
language	zh-TW
format	Others
sources	NDLTD
description	碩士 === 國立清華大學 === 電子工程研究所 === 102 === 因申請專利緣故，資料延後公開
author2	黃智方
author_facet	黃智方江政毅
author	江政毅
spellingShingle	江政毅 Development of Novel Implant Masking Processes for Double Self-Aligned 4H-SiC DMOSFETs
author_sort	江政毅
title	Development of Novel Implant Masking Processes for Double Self-Aligned 4H-SiC DMOSFETs
title_short	Development of Novel Implant Masking Processes for Double Self-Aligned 4H-SiC DMOSFETs
title_full	Development of Novel Implant Masking Processes for Double Self-Aligned 4H-SiC DMOSFETs
title_fullStr	Development of Novel Implant Masking Processes for Double Self-Aligned 4H-SiC DMOSFETs
title_full_unstemmed	Development of Novel Implant Masking Processes for Double Self-Aligned 4H-SiC DMOSFETs
title_sort	development of novel implant masking processes for double self-aligned 4h-sic dmosfets
publishDate	2014
url	http://ndltd.ncl.edu.tw/handle/61123879564193766458
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Development of Novel Implant Masking Processes for Double Self-Aligned 4H-SiC DMOSFETs

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