The Deposition and Microstructure of Tungsten Oxide Films by Physical Vapor Deposition
碩士 === 國立中央大學 === 機械工程學系 === 102 === Tungsten oxide film under different oxygen flow rates are deposited by DC sputtering. The deposition process is monitored by the Langmuir probe, optical emission spectrometer and mass spectrometer. From the voltage change at target and all plasma parameters, we f...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2014
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/5j52w4 |