Electric-field Analysis of Interconnect Dielectrics in Integrated Circuit
碩士 === 國立交通大學 === 照明與能源光電研究所 === 102 === Scaling the next-generation Integrated Circuits (ICs) has shorten the distance between interconnected lines which increases electrical fields between them. This may cause breakdown in dielectrics between interconnect line during IC operation, resulting in mal...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/88230215454340559680 |