Study of large-area high-uniformity plasma deposition silicon-based thin-film solar cell
博士 === 國立交通大學 === 光電工程研究所 === 102 === This paper is the study of hydrogenated amorphous silicon-based thin film by plasma-enhanced chemical vapor deposition system (PECVD). And supplemented Very high frequency plasma technology (VHF) for deposited silicon based thin film solar cells. Deposited thin...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/05707636639407284286 |