Comprehensively Investigate Electrical, Physical and Reliability Characteristics of Low-k Dielectrics under Oxygen Plasma Treatment
碩士 === 國立暨南國際大學 === 電機工程學系 === 102 === This thesis comprehensively investigates the effects of oxygen (O2) plasma treatment on porous low-k dielectric materials. It can be divided into five parts as follows. The degradation induced by O2 plasma irradiation to the various low dielectric constant mate...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/2y9kgw |