Periodically wedge structures fabricated by nano-imprint high aspect ratio soft stamp and E-beam lithography and its application to liquid crystal alignments
碩士 === 國立成功大學 === 光電科學與工程學系 === 102 === In this study, we use nano-imprint lithography(NIL) to produce high aspect ratio soft stamp, and make it buckle while imprinting to generate periodic wedge groove structures. After that, we let the structures coated by two different vertical alignment layer, m...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/64195202010929345758 |
| Summary: | 碩士 === 國立成功大學 === 光電科學與工程學系 === 102 === In this study, we use nano-imprint lithography(NIL) to produce high aspect ratio soft stamp, and make it buckle while imprinting to generate periodic wedge groove structures. After that, we let the structures coated by two different vertical alignment layer, monoglycidyl ether-terminated PDMS and polyimide. And observe their vertical alignments to liquid crystals (LCs) with negative dielectric anisotropy. We find out that the liquid crystal cells with wedge structures can obviously reduce the disclination lines compared to rectangular structures. In addition, we produce wedge structures with different pitches and heights by electron beam lithography(E-beam Lithography). The results show that when the pitch gets smaller or height gets larger. The anchoring force of groove direction will become larger after we apply the voltage, so the LCs will prefer to align in the groove direction. And the results are consistent with the Berreman’s theory.
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