Periodically wedge structures fabricated by nano-imprint high aspect ratio soft stamp and E-beam lithography and its application to liquid crystal alignments

碩士 === 國立成功大學 === 光電科學與工程學系 === 102 === In this study, we use nano-imprint lithography(NIL) to produce high aspect ratio soft stamp, and make it buckle while imprinting to generate periodic wedge groove structures. After that, we let the structures coated by two different vertical alignment layer, m...

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Bibliographic Details
Main Authors: WeiChang, 張緯
Other Authors: Chung-Hung Lin
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/64195202010929345758