Extra photo-resist films fabricated in liquid crystal lens array to prevent occurrence of disclination line
碩士 === 國立成功大學 === 光電科學與工程學系 === 102 === In this thesis, a proposed method used to prevent the problem of disclination line occurrence in liquid crystal lens arrays is investigated, which way is extra non-patterned or patterned SU8 photoresist films coated on patterned ITO films. When SU8 films achie...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/71088699505717175506 |