Diamond-like Carbon Films Deposited by Plasma-assisted Chemical Vapor Deposition

• Main Authors: Yih-YeongNg, 黃羿詠
• Other Authors: Chau-Nan Hong
• Format: Others
• Language: zh-TW
• Published: 2014
• Online Access: http://ndltd.ncl.edu.tw/handle/s9nz9t

碩士 === 國立成功大學 === 化學工程學系 === 102 === The C60 incorporated diamond-like carbon films with low wear as well as high hardness were deposited on high temperature Si(100) substrate by RF-plasma-assisted chemical vapor deposition under different C60 content in acetylene. The lowest wear rate was achieved by 87.77 (10^-7mm3/mN) with 26.48 GPa in hardness. Incorporation of C60 into DLC decreases hardness, however decreases wear rate as well as friction coefficient within a range of suitable C60 content; beyond this range, over content of C60 endows DLC with high roughness therefore increases wear rate as well as friction coefficient.