The Electrochemical Study of NiW Alloy Electrodeposition for Filling Through Silicon Vias

碩士 === 國立中興大學 === 化學工程學系所 === 102 === After Damascus technology revolution, copper metallization and chemical mechanical polishing (CMP) technique replace the old process of aluminum metallization, which has led to a great industrial transformation. To meet the requirement of state-of-the-art electr...

Full description

Bibliographic Details
Main Authors: Hsin-Wei Wang, 王欣為
Other Authors: 竇維平
Format: Others
Language:zh-TW
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/54029402143583909156