The Investigation of Sputtering Deposition of AlN and its Optoelectronic Applications
博士 === 中原大學 === 電子工程研究所 === 102 === In this study, Aluminium Nitride thin films have been deposited directly on sapphire substrates at low temperatures (300-500℃) by a helicon sputtering system. The structural quality of AlN films was characterized by X-ray diffractometry and transmission electron m...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/75321229388226053077 |