Study of Electrochemical Device with Ta2O5 Protective Layer
碩士 === 正修科技大學 === 電機工程研究所 === 102 === The study adopts RF magnetron sputtering coating electrochromic tungsten oxide (WO3) and protective layer (Ta2O5) films on ITO/Glass substrate, and testing electrochemical stability in order to investigate the protective layer on the presence or absence of the p...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2014
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| Online Access: | http://ndltd.ncl.edu.tw/handle/82370566805648615223 |