Applying Kappa analysis method for attritube measurement system-a case study of a semiconductor foundry

• Main Authors: Lin,Mei-Hua, 林美花
• Other Authors: Wang, Wen-Liang
• Format: Others
• Language: zh-TW
• Published: 2014
• Online Access: http://ndltd.ncl.edu.tw/handle/96761712352886951155

碩士 === 中華大學 === 資訊管理學系碩士班 === 102 === As nanotechnology has become a tendency for the semiconductor industry in the 21st century, how to preserve the competitive advantage in the international market and meet the customer requirements for product quality is a challenge for the sustainability of an enterprise. Since some of the quality characteristics of semi-finished or finished products can not be detected by the automatic screening instrument, therefore visual inspections by experienced technicians are needed instead to determine the quality of the product. The efficiency of an enterprise shall be enhanced if the accuracy of the visual inspections can be improved. This study is based on the attribute of GO/NO GO measurement system and the application of Kappa inter-rater reliability in the continuous improvement activities for quality measurement, to explore the accuracy, consistency, and the Kappa inter-rater reliability in the inspection process for examining the same product by different personnel, to effectively block the outflow of defective products which can cause a company's loss. We also apply Chi-Square test to analyze if there’s exist significant differences in between the independent variables such as production units, day/night shift, seniority, and the consistency, correct, effectiveness. Keywords: attribute GO/NO GO, Kappa inter-rater reliability, Chi-Square tests