Back end anneal effect on negative bias temperature instability for PMOS in 30nm DRAM technology

碩士 === 長庚大學 === 電子工程學系 === 102

Bibliographic Details
Main Authors: Jen Te Hsu, 徐仁德
Other Authors: C. S. Lai
Format: Others
Published: 2014
Online Access:http://ndltd.ncl.edu.tw/handle/25883628199738499105