The influence of Mo:Ta in TFT etching process

The influence of Mo:Ta in TFT etching process

碩士 === 元智大學 === 光電工程學系 === 101 === For replacing the Cr by using Mo:Ta, in addition to the sheet resistance of Cr lower than Mo:Ta, the resistance also higher than Mo:Ta. For expending understand the electric characteristic of panel, we have to discuss about Mo:Ta in depth. After research, we can im...

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Main Authors: Chung-Nan hsu, 徐忠楠
Other Authors: Chung-Pin Liu
Format: Others
Language:zh-TW
Online Access:http://ndltd.ncl.edu.tw/handle/71314695029665671929
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spelling ndltd-TW-101YZU056141572016-03-18T04:41:49Z http://ndltd.ncl.edu.tw/handle/71314695029665671929 The influence of Mo:Ta in TFT etching process Mo:Ta對TFT蝕刻製程影響之研究 Chung-Nan hsu 徐忠楠 碩士 元智大學 光電工程學系 101 For replacing the Cr by using Mo:Ta, in addition to the sheet resistance of Cr lower than Mo:Ta, the resistance also higher than Mo:Ta. For expending understand the electric characteristic of panel, we have to discuss about Mo:Ta in depth. After research, we can improvement the over etching by using two step etching, and optimize the process parameter by using taguzi experiment plan. Finally, the resistance and circuit value are better than Cr, and for green conception, also decrease the hazard by Cr6+ from Cr. Chung-Pin Liu 劉宗平 學位論文 ; thesis 66 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 元智大學 === 光電工程學系 === 101 === For replacing the Cr by using Mo:Ta, in addition to the sheet resistance of Cr lower than Mo:Ta, the resistance also higher than Mo:Ta. For expending understand the electric characteristic of panel, we have to discuss about Mo:Ta in depth. After research, we can improvement the over etching by using two step etching, and optimize the process parameter by using taguzi experiment plan. Finally, the resistance and circuit value are better than Cr, and for green conception, also decrease the hazard by Cr6+ from Cr.
author2 Chung-Pin Liu
author_facet Chung-Pin Liu
Chung-Nan hsu
徐忠楠
author Chung-Nan hsu
徐忠楠
spellingShingle Chung-Nan hsu
徐忠楠
The influence of Mo:Ta in TFT etching process
author_sort Chung-Nan hsu
title The influence of Mo:Ta in TFT etching process
title_short The influence of Mo:Ta in TFT etching process
title_full The influence of Mo:Ta in TFT etching process
title_fullStr The influence of Mo:Ta in TFT etching process
title_full_unstemmed The influence of Mo:Ta in TFT etching process
title_sort influence of mo:ta in tft etching process
url http://ndltd.ncl.edu.tw/handle/71314695029665671929
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AT xúzhōngnán motaduìtftshíkèzhìchéngyǐngxiǎngzhīyánjiū
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