The influence of Mo:Ta in TFT etching process
碩士 === 元智大學 === 光電工程學系 === 101 === For replacing the Cr by using Mo:Ta, in addition to the sheet resistance of Cr lower than Mo:Ta, the resistance also higher than Mo:Ta. For expending understand the electric characteristic of panel, we have to discuss about Mo:Ta in depth. After research, we can im...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/71314695029665671929 |