A Study on the Preparation of Silicon Oxynitride Gas Barrier by Using Plasma Enhanced Chemical Vapor Deposition
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 101 === In this study, tetramethyl silane, ammonia and oxygen mixed gas as a source gas, and using plasma enhanced chemical vapor deposition system in the flexible plastic substrate prepared by high gas capacity of silicon oxynitride films, study discussed in detai...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/5fknr7 |