Atomic layer deposition of Al2O3 films on silicon wafers and their passivation property
碩士 === 國立臺灣科技大學 === 化學工程系 === 101 === Surface passivation and anti-reflection are important issues for silicon based solar cells. In this thesis, we deposited Al2O3 passivation films on silicon wafers using atomic layer deposition (ALD) technique. First of all, self-limiting growth region for Al2O3-...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/83771813305358570568 |