Effect of ion bombardment on texture and properties of TiN thin films deposited by High Power Impulse Magnetron Sputtering
碩士 === 國立清華大學 === 工程與系統科學系 === 101 === Nano-crystalline TiN thin films were successfully deposited on (100) silicon substrate utilizing a high power impulse magnetron sputtering (HIPIMS) system. The purpose of this research was to investigate the effects of ion bombardment on the texture, mechanical...
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| Format: | Others |
| Language: | en_US |
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2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/46157164619840046623 |