Study of ZnO film growth by LP-MOCVD using DEZn and N2O as precursors

碩士 === 國立東華大學 === 材料科學與工程學系 === 101 === In this research, we prepare ZnO thin film by low-pressure metal-organic chemical vapor deposition (LP-MOCVD), using DEZn as zinc precursor and N2O as oxygen precursor. We observed a special structure which has potential for development into a large single c...

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Bibliographic Details
Main Authors: Chih-Wei Li, 李治緯
Other Authors: Yi-Jia Chen
Format: Others
Published: 2013
Online Access:http://ndltd.ncl.edu.tw/handle/44156881137611763955