Langmuir probe and OES diagnostic study of ECR plasma for amorphous silicon deposition process
碩士 === 國立中央大學 === 光機電工程研究所 === 101 === Optical emission spectroscopy (OES) and homemade Langmuir probe are used for in-situ diagnosing the mixed H2-SiH4-Ar plasma characteristics in an electron cyclotron resonance chemical vapor deposition (ECR-CVD) system for hydrogenated amorphous silicon (a-Si:H)...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/76298976637217918622 |