Development of Hydrogenated Amorphous Silicon Oxide Cell for Multi-Junction Thin Film Solar Cell Application
碩士 === 國立交通大學 === 光電工程學系 === 101 === In this study, plasma-enhanced chemical vapor deposition (PECVD) was used to deposit hydrogenated amorphous silicon oxide (a-SiOX:H) cell for multi-junction thin-film solar cell application. In order to improve the cell performance of a-SiOX:H cell, absorber and...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/32428502959095054749 |