The application of disilane-plasma deposition technology in silicon-based thin-film solar cells

碩士 === 國立交通大學 === 光電工程學系 === 101 === In this article, we investigate the performance of hydrogenated amorphous silicon-based thin-film fabricated by high-density plasma chemical vapor deposition system. The solar spectra in near infrared regime (<750 nm) can not be effective absorbed due to the h...

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Bibliographic Details
Main Authors: Hsiao, Tzu-Hsuan, 蕭子軒
Other Authors: Yu, Pei-Chen
Format: Others
Language:zh-TW
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/86011432770879788436