The Study of High-k Composite Dielectric for InGaAs MOS Device Applications

碩士 === 國立交通大學 === 光電系統研究所 === 101 === III-V metal-oxide-semiconductor field effect transistors (MOSFETs) have been widely investigated in recent years. InXGa1-XAs material has high electron mobility and the InXGa1-XAs based devices have lower turn on voltage than conventional Si devices. Therefore,...

Full description

Bibliographic Details
Main Authors: Chuang, Ting-Wei, 莊庭維
Other Authors: Chang, Edward Yi
Format: Others
Language:en_US
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/583ak6