Investigation of Activation and Re-crystallization of Ultra-shallow Junctions by Low Temperature Microwave Annealing
碩士 === 國立成功大學 === 電機工程學系碩博士班 === 101 === As gate length decreases, extension junction depth must also scale. In order to achieve ultra-shallow junction (USJ), low energy ion implantation and low temperature microwave annealing were used in this study. In this study, microwave annealing (MWA) and fem...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/34941031387488545282 |