n-Type amorphous carbon thin films prepared by radio-frequency plasma enhanced chemical vapor deposition using ammonia/ethylene mixtures
碩士 === 國立中興大學 === 材料科學與工程學系所 === 101 === The study investigates the effects of different NH3/C2H4 ratios and annealing temperatures on the properties of n-type amorphous hydrogenated carbon thin (a-C:H(N)) films deposited on p-type silicon substrate prepared by plasma enhanced vapor deposition. The...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/59667031760656102186 |