Preparation and Characterization of μc-Si:H Thin Films and p-i-n Thin Film Solar Cells.
碩士 === 明志科技大學 === 材料工程研究所 === 101 === Abstract An ICP-CVD (Inductively coupled plasma CVD) system attached with four internal antennas was used to deposit Si thin films. Hydrogenated nanocrystalline silicon (nc-Si:H) films were prepared as functions of RF power, working pressure, and the flow ratio...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2013
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| Online Access: | http://ndltd.ncl.edu.tw/handle/26441114780676869302 |