Optical Inspection for The Defects of Patterned Sapphire Substrate

• Main Authors: Zhong, Ying-Jia, 鍾英加
• Other Authors: Chen, Shih-Feng
• Format: Others
• Language: zh-TW
• Published: 2013
• Online Access: http://ndltd.ncl.edu.tw/handle/97083140887488095624

碩士 === 龍華科技大學 === 工程技術研究所 === 101 === The main purpose of this study is to design an optical inspection system for testing defects on the Patterned Sapphire Substrate. When designing an optical inspection system we use image processing tools such as Visual C++ with OpenCV. First, we must use the CMOS camera to take images. Environment, the way of lighting and uniformity of light are the most important when designing an optical inspection system. In this study, we used red back light as light source, after grabbing images we must do image processing in advance to help reduce noise and enhance features we want, such as Histogram Equalize, Gaussian Blur and Local Threshold. Finally we captured image features with Blob Analsis, and deleted the smaller noise. In addition, filled holes in images to determine whether it is defects. With this method we can test two kinds of defectively plaid lines and light spot on the Patterned Sapphire Substrate.