The Applications of Improvement in Contact Resistances by Hydrogen Plasma and Thermal Annealing Treatment for a-IGZO Thin Film Transistors
碩士 === 國立雲林科技大學 === 電子與光電工程研究所碩士班 === 100 === In this study, the thin films were prepared on the glass substrates at room temperature by Radio Frequency Magnetron Sputtering. The influence of substrate location, rf power, oxygen partial pressure and thin film thickness on the characteristics of amor...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/93741876264537644311 |