fabrication of gallium oxide nano-dots for resistive random access memory (RRAM) using atomic force microscopy local anodic oxidation

碩士 === 大同大學 === 光電工程研究所 === 100 === Recently , the resistive random access memory (RRAM) has been extensively investigated . The main structure from the Metal-Insulator- Metal (MIM) stacking, with the low process temperature makes the RRAMs integrated to the conventional IC process practically. In a...

Full description

Bibliographic Details
Main Authors: Chia-Hsiang Hsu, 徐家翔
Other Authors: Jeff Tsung-Hui Tsai
Format: Others
Language:zh-TW
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/70718890690496649327