Study on the low electrical resistivity metal oxide thin films
碩士 === 中國文化大學 === 化學工程與材料工程學系奈米材料碩士班 === 100 === We use the AlFeCoNi、CrFeCoNi、TiCo1.5Ni1.5 alloy target deposited the thin films in this paper. Then, some of the thin films were vacuum annealed at high temperature for investigating the effects of annealing conditions on their electrical resistivity...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/r779v7 |